Hiden Analytical Ltd. Industries
-
Agriculture - Aquaculture
-
-
-
-
Hiden Ion Milling Probe – End Point Detector The only dedicated end point determination tool for ion etch control and optimum process quality. End point Analysis. Target Impurity Determination. Quality Control / SPC. Residual Gas Analysis. Leak Detection The IMP is a differentially pumped, ruggedized secondary ion mass spectrometer for the analysis of secondary ions and neutrals from the ion mill process, featuring: High Sensitivity SIMS / MS with Pulse Ion Counting Detector. Triple...
Hiden plasma probes measure some of the key plasma parameters and provide detailed information relating to plasma reaction chemistry. Plasma diagnostics for applications in etching, deposition, coating and surface modification. ECR – Electron Cyclotron Resonance plasma Magnetron sputtering High power impulse magnetron sputtering, HIPIMS ICP inductively coupled plasma, and RF plasma Dielectric-barrier discharge (DBD)
SIMS - for depth profiling, surface composition measurement, and elemental imaging, Hiden's SIMS Workstation provides a complete analytical facility. RGA - The Hiden quadrupole mass spectrometers provide high sensitivity detection capability for the most demanding XHV/UHV vacuum environments. The pulse ion counting detector enables measurement of both positive and negative ions through 7 continuous decades, the integral accumulation mode being used for the capture of discreet particle events. UHV Temperature...
XBS Triple Filter Quadrupoles configured for multiple source monitoring in MBE deposition applications. The custom configured ioniser provides for high stability, high senstivity monitoring of oxides and metals from both k-cell and e-gun sources. MBE monitoring and control. Molecular Beam Studies. Multiple beam source analysis. High Performance RGA. Desorption / Outgassing studies / Bakeout cycles. Chamber / Process gas Contaminants. Hiden XBS mass spectrometers for high precision scientific,...