Manufacturing TFT/LCD displays requires waste gas treatment as well. Processes that produce large scale Thinfilm Transistors (TFT) on glass substrates, for instance, use Chemical Vapour Deposition – CVD – to separate the thin films onto the material. The process requires cleaning the process chamber periodically and usually employs etching with NF3. Etching of the separated thin films typically utilises CF4, SF6 and chlorinated gases, which release large amounts of waste gas mixtures.
By DAS Environmental Expert GmbH based in Dresden, GERMANY.
Gasification and synthetic gas production from various waste products are becoming increasingly important energy recovery technologies. Often, the synthetic gas contains various hazardous contaminants including H2S, HCl and other acids, heavy metals, and tars. The gas requires cleaning before it is introduced in the engine or boiler. Most of these processes generate significant concentration of tars. The tars can vary from very low molecular weight to large and complex chains.
By Macrotek Inc. based in Markham, ONTARIO (CANADA).
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