Vertically integrated molybdenum sputtering target manufacturer for thin film photovoltaics to display 4.2m rotary target at 24th EU PV SEC
H.C. Starck, FPR Group, announces increased focus on producing high quality sputtering targets for the thin film photovoltaic industry in both planar and rotatable forms. At the 24th EU PV SEC in Hamburg from 21 to 25 September, four (4) extruded rotary targets from 550mm to 4.2m in length will be on display at their booth located in Hall B2G, Booth 39. Extruded targets offer superior sputtering performance being virtually fully dense and having extremely low oxygen levels.
Targeting CIGS, a-Si (amorphous silicon) and CdTe thin films solar module manufacturers, H.C. Starck has been developing and successfully producing custom sputtering targets in molybdenum (Mo) and nickel based (Ni) alloys, along with its other core competency materials: tantalum (Ta), niobium (Nb) and tungsten (W).
H.C. Starck, a leading worldwide manufacturer of refractory metals and fabricated products, uses highly specialized equipment and technologies capable of producing rotatable sputtering targets at the height of the most demanding requirements of target users in the areas of LCD display, large area coating and solar cell applications. Newly developed processes allow a wider range approach to materials used in thin film PV such as silver, Al, ZnAl, etc.
With their 5,000 metric ton direct extrusion press, unique in the refractory metals business, H.C. Starck can produce rotary targets for all 125 mm (monolithic) and 135 mm (bonded) applications in molybdenum up through the current largest large area coating rotary target requirement. In alloys of lower high temperature strength like niobium, CP Ti, copper, etc., they are typically able to produce multiples of a single target.
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