ESCAPE (burn/wet) - Point-of-Use Waste Gas Treatment System
From Waste Gas Treatment
The ESCAPE technology offers an optimum combination of the two operating procedures burning & scrubbing in the smallest possible space. A concept many DAS systems for waste gas treatment use. It is an effective and highly versatile technology for point-of-use waste gas treatment with a low cost of ownership. Based on this burn/wet-technology we have developed the ESCAPE product line, which offers flexible and customized applications for the abatement of almost all process waste gases in the semiconductor and photovoltaic industries. Both heights and media supply are variable. All ESCAPE systems have a small footprint with service and maintenance access from the front and back. Installation is quick and easy and does not require specialized equipment. Operation costs and general safety can be optimized with a process tool interface.
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The following equipment options are available for ...
The following equipment options are available for all ESCAPE systems:
- Power Supply: 3 x 400 V/50 Hz or 3 x 208 V/60 Hz
- Fuel Gas: NG, LPG, H2
- Oxidant: O2, CDA
- Heated feed lines and inlets
- Process-Tool-Interface
- Signal Tower
- Drip Pan
- Earthquake Safety Kit
- Monitoring
Operating Principle of ESCAPE Waste Gas Treatment Systems
Hazardous substances of process waste gases are abated directly from where they originate (Point-of-Use, POU). Waste gases are fed into a ring-shaped burner apparatus. Depending on the chemical composition of the waste gases, various reactions take place (oxidation, reduction, pyrolysis). In the subsequent scrubbing process, soluble, gaseous and solid compounds generated by combustion are absorbed and cooled down by a suitable scrubbing liquid. The immediate scrubbing neutralizes combustion products such as hydrogen halides and all remaining residual gases meet the strict standards of German air pollution law (TA Luft).
ESCAPE INLINE - Our Basic System for Waste Gas Treatment
ESCAPE INLINE is our tried and tested basic system, optimized for up to four independent inlets of semiconductor and photovoltaic process tools. It runs on diverse fuel gases and scrubber liquids. As an alternative to the scrubber liquid’s feed-through-system the reactor can be equipped with a water-conserving closed-loop design.
Features
- Up to 4 independent inlets
- Runs with different fuel gases
- Low water consumption through closed-loop design
- Available in 2 sizes
- SEMI S2 compliant
Technical Data
- Dimensions (W x D x H):
- 855 mm x 675 mm x 1800/2070 mm
- Access to maintenance area on front and back side
- Gas entry: max. 4 x DN25 or DN40
- Gas outlet: DN100
Process Waste Gas from Epitaxy is treated by ESCAPE PLUS
ESCAPE PLUS was specifically developed for applications involving large amounts of hydrogen as they typically occur in epitaxy processes. The system runs on various fuel gases, meets the highest safety standards, and is equipped with a water feed-through-system, which enables the discharge of large amounts of water without a cooling system.
Features
- Up to 4 independent inlets
- Runs with different fuel gases
- Available in 2 sizes
- SEMI S2 compliant
Technical Data
- Dimensions (W x D x H):
- 855 mm x 675 mm x 1800/2070 mm
- Access to maintenance area on front and back side
- Gas entry: max. 4 x DN25 or DN40
- Gas outlet: DN100
Dual Treatment of Waste Gases with ESCAPE TWICE
ESCAPE TWICE is a complete double system within one cabinet and a single control unit. The double system is optimized for up to eight independent inlets of semiconductor and photovoltaic process tools. In principle, it is available in the same versions as ESCAPE INLINE.
Features
- Up to 4 independent inlets per reactor
- Runs with different fuel gases
- Low water consumption through closed-loop design
- SEMI S2 compliant
Technical Data
- Dimensions (W x D x H):
- 1650 mm x 675 mm x 2070 mm
- Access to maintenance area on front and back side
- Gas entry: max. 2 x 4 x DN25 or DN40
- Gas outlet: max. 2 x DN100
Waste Gas Treatment with Backup-Function – ESCAPE DUO
ESCAPE DUO is a double-reactor offering two scrubbing systems that can operate simultaneously. It is optimized for up to four independent inlets of semiconductor and photovoltaic process tools. In case of malfunction or maintenance on one reactor, the other backs up the treatment of all waste gases (internal back-up), which ensures the equipment’s near 100 % uptime.
Features
- Up to 2 independent waste gas and backup lines per reactor
- Near 100 % operation time through backup function
- Second reactor allows uninterrupted operation during maintenance
- Runs with different fuel gases
- Low water consumption through closed-loop design
- Available in two sizes
- SEMI S2 compliant
Technical Data
- Dimensions (W x D x H):
- 1650 mm x 675 mm x 1800/2070 mm
- Access to maintenance area on front and back side
- Gas entry: max. 2 x 2 DN25 or DN40
- Gas outlet: max. 2 x DN100
Maximum Waste Gas Treatment with ESCAPE TWIN
ESCAPE TWIN is a system with one main and one back-up reactor. It is optimized for up to four independent inlets of semiconductor and photovoltaic process tools. In case of malfunction or maintenance of the main reactor the back-up reactor takes over the waste gas treatment, which ensures the equipment’s near 100 % uptime.
Features
- Main reactor with up to 4 independent inlets
- Near 100 % operation time through back-up function
- Back-up reactor allows uninterrupted operation during maintenance
- Runs with different fuel gases
- Low water consumption through closed-loop design
- SEMI S2 compliant
Technical Data
- Dimensions (W x D x H):
- 1650 mm x 675 mm x 1800/2070 mm
- Access to maintenance area on front and back side
- Gas entry: max. 4 x DN25 or DN40
- Gas outlet: max. 2 x DN100
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