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Contamination Wafer Equipment & Supplies
4 equipment items found
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Manufactured by:Applied Physics based inTampa, FLORIDA (USA)
A Contamination Wafer Standard is a NIST traceable, particle wafer standard with Size Certificate included, deposited with monodisperse silica nano-particles and narrow size peak between 30 nm and 2.5 microns to calibrate the size response curves of KLA-Tencor Surfscan SP3, SP5 SP5xp wafer inspection systems and Hitachi SEM and ...
Manufactured by:Microcertec SAS based inCollegien, FRANCE
Chucks and end-effectors are used to manipulate and carry silicon wafers through the whole production process. The chemical inertness of ceramics allows those components to be contamination-free for the wafer in particular in chemical wet etching baths. These items enable the handling of large-size wafers and can be designed ...
Manufactured by:VLSI Standards, Inc. based inMilpitas, CALIFORNIA (USA)
RAISE YOUR GLASS. The Silica Contamination Standard (SCS) is used to calibrate high-intensity UV tools which size and detect silica particles on the surface of bare silicon wafers. Use SCS to characterize particles, before particles characterize ...
Manufactured by:Tystar Corporation based inGarden Grove, CALIFORNIA (USA)
They are designed to optimize floor space and energy consumption without compromising performance. The systems are equipped with advanced wafer processing capabilities, offering precise control over temperature, gas flow, timing, and sequencing, which can be managed via a touch screen console. The modular design includes components like the FCS-10/30 Furnace Control System and ...