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Plasma Etch Process Equipment & Supplies
4 equipment items found
Manufactured by:Intellemetrics based inPaisley, NORTHERN IRELAND
The LEP500 is a specialized system designed for real-time, in-situ monitoring and endpoint detection within plasma etch processes. It is geared towards enhancing precision in semiconductor, optoelectronics, MEMS, and thin film removal applications by providing accurate etch depth and rate data. The system can be swiftly ...
Manufactured by:Meyer Burger based inGwatt (Thun), SWITZERLAND
The MAiA® platform - an enhanced version of SiNA® - provides a range of options for implementing new technological approaches to increasing the efficiency of crystalline silicon solar cells. MAiA systems are also modular, and consist of several processing modules that are joined via buffer modules so that several processes can be carried out successively in one system. Each system is ...
Manufactured by:Advanced Energy Industries, Inc. based inDenver, COLORADO (USA)
Advanced Energy’s eVoS platform is a revolutionary power technology for the direct control of ion energy distribution in plasma processing. The integrated, single-enclosure system delivers a customized width and precise control of ion energy for node etch and deposition applications. With a 1.2 kV asymmetric waveform, the eVoS LE applies ...
Manufactured by:SENTECH Instruments GmbH based inBerlin, GERMANY
The SENTECH SI 500 ICP-RIE System represents advanced inductively coupled plasma reactive ion etching technology, tailored for both research and industrial applications. Its core feature, the proprietary Planar Triple Spiral Antenna (PTSA) plasma source, offers uniform plasma generation with high ion density and low ion energy, ...