Tempress - BBr3 Diffusion Furnace System
Tempress is world market leader in the production of diffusion furnace systems for Boron diffusion (BBr3). With 1.5 GWp installed base, we are a valuable partner for the n-type solar cell manufacturing industry. For p-type surface doping of n-type silicon, BBr3 diffusion is one of the most simple and cost-effective solutions. BBr3 diffusion offers an integrated solution of deposition of a BSG diffusion source layer and actual thermal diffusion of boron from this layer into the silicon. Tempress BBr3 diffusion systems are designed and built based on many years of semiconductor and solar photovoltaic industry experience.
Key System Features
- High throughput >100 MW / system
- Uniform process results over entire load
- Integrated solution with fine pitch back-to-back automation available
Customer Benefits
- Plug and play solution, proven in production
- Tempress recipe for Boron emitter formation without Boron Rich Layer
- Emitter formation for high-efficiency n-type solar cells
- Maximum uptime and lowest cost of ownership
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