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Applied Physics products
Wafer Standards
Applied Physics - Contamination Wafer Standard
A Contamination Wafer Standard is a NIST traceable, particle wafer standard with Size Certificate included, deposited with monodisperse silica nano-particles and narrow size peak between 30 nm and 2.5 microns to calibrate the size response curves of KLA-Tencor Surfscan SP3, SP5 SP5xp wafer inspection systems and Hitachi SEM and TEM systems. The Silica Contamination Wafer Standard is deposited as a FULL Deposition with a single particle size across the wafer; or can be deposited as a SPOT Deposition with 1 or more silica particle size standards precisely located around the wafer. Silica Contamination Wafer Standards are used for size calibration of KLA-Tencor Surfscan tools, Hitachi SEM and TEM tools.
