Indeotec SA products

The OCTOPUS III system is going to be our high-volume or mass production tool and is still under development. Based on the concept of the OCTOPUS II design advantages all the unique features, such as the mirror reactor design or the cost-minimizing handling concept, will make a very reliable and cost saving production.

Our team of engineers has arduously worked into developing the finest plasma deposition technology that has ever been available to R&D labs and PV cell manufacturers. Our heavy investment in R&D has given birth to IRFE - Integrated Radio Frequency Electrode. This exclusive technology, proprietary of INDEOtec, provides exceptionally stable plasma with high uniformity on the deposited substrate. Superior plasma properties result in excellent thin layer parameters as it has been demonstrated.

This all-new technology sets a new benchmark in the PECVD deposition universe. The INDEOtec team has worked successfully at the development of a really innovative reactor system, which allows the deposition of both sides of a substrate without any need to break the vacuum and without the need of substrate flipping.

With the OCTOPUS II system generation an inline PVD deposition module is available, which facilitates complete deposition cycles of substrates or wafers (for example, heterojunction devices) in one tool, without additional handling and vacuum breakage. The module has been designed for top and bottom side deposition in one single run.

Various substrate pre-treatment and handling modules contribute to the flexibility and versatility of the OCTOPUS cluster tool system. No matter if preferably used for research purposes or for pilot scale test series, the tool can be configured according to the specific needs.