Intellemetrics products

The LEP500 is a specialized system designed for real-time, in-situ monitoring and endpoint detection within plasma etch processes. It is geared towards enhancing precision in semiconductor, optoelectronics, MEMS, and thin film removal applications by providing accurate etch depth and rate data. The system can be swiftly integrated into most modern plasma etch machines via a clear normal incidence view port, often found in the center of the top electrode. It offers robust process control solutions by reducing noise interference and minimizing setup costs in both production and R&D environments. Equipped with EtchDirector software, it enables real-time calculation and control of etch parameters, thereby optimizing process termination. The LEP500 can function as both a standalone unit and an integrated part of OEM etch tools, supporting a straightforward communication interface.