Revolutionizing Surface Engineering: Introducing HiPIMS Technology for Advanced Coating Solutions

In a significant advancement in the field of surface engineering, Hiden Analytical is thrilled to introduce the High-Power Impulse Magnetron Sputtering (HiPIMS) technique – a cutting-edge method derived from the conventional magnetron sputtering process, designed to enhance the quality and durability of coated surfaces.

HiPIMS technology sets a new standard in coating applications by utilising short, intense pulses of energy delivered to the cathode, achieving peak power in the kW to MW range. This innovative approach generates an extremely dense plasma near the cathode, far surpassing the limitations of traditional sputtering methods. With pulses applied in a low duty cycle (10-100 μs), HiPIMS not only maintains a lower average operating power but also significantly reduces the heat output, making it a highly efficient and practical solution for a wide range of applications.