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Ondasonics Energy Equipment & Supplies
1 equipment items found
Manufactured by:Onda Corporation based inSunnyvale, CALIFORNIA (USA)
Wet photomask cleaning relies on megasonic agitation to enhance the process, but there are many challenges to reliably control performance in terms of particle removal efficiency (PRE) and damage. With the shift to pellicle-free EUV masks, photomask processes are more vulnerable to contamination. This gap exists largely because of the unavailability of appropriate measurement of the acoustic ...