Class 5 Photonics

CLASS 5Model White Dwarf TPA -Laser System for Two-Photon Absorption Nanolithography

SHARE

The White Dwarf TPA is a specialized femtosecond laser system dedicated to maskless nanolithography through two-photon absorption (TPA). This system stands out due to its remarkable average power output and high repetition rate, crucial for advancing nano-resolution capabilities and boosting production speeds in nanofabrication. Its compact, single-box design ensures robust integration into existing setups, while the advanced pulse control technology allows operators to finely tune pulse intensity and dispersion according to the specific requirements of their samples, resulting in enhanced nanofabrication productivity. Key features of the White Dwarf TPA include high power stability over extended periods, with a spectrum centered at 800 nm and pulse durations measured at 40 fs. It delivers over 8 W of average power at microjoule pulse energies, providing a distinct advantage over conventional systems that either compromise on power or pulse duration. The combination of high peak power and rapid repetition enhances productivity in TPA applications, supported by advanced optical strategies like spatial multiplexing.

Most popular related searches

Most Powerful Lasers for Two-Photon Absorption (TPA) Nanolithography.

The White Dwarf TPA is a femtosecond laser system specifically designed for two-photon absorption (TPA) maskless nanolithography, offering unparalleled performance and precision.

The exceptional average power and repetition rate of the White Dwarf TPA enables researchers and engineers to scale nano-resolution and production speed, reaching new horizons of nanofabrication. Its compact, one-box solution ensures robustness and ease of machine integration.

Enhanced pulse control allows you to match your pulse intensity and dispersion management to the sample – for ultimate nanofabrication productivity.

Highest Average Power

more than 8 W at 2 MHz repetition rate.

One-Box Design

an integrated temperature stabilized one-box design enhancing compactness and robustness.

Enhanced Pulse Control

optional dispersion compensation for optimal pulse intensity at the sample.
  • Maskless TPA Nanolithography
  • Opto-couplers
  • Microlenses
  • Metamaterials
  • Surface functionalization
  • Multi-photon imaging