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Aster - Model OXISTAR -High Temp Oxidation Machine
High Temp Oxidation Furnace. Horizontal wafer batch processing. Dry & Wet Oxidation up to 1600°C. Oxygen free from 20°C. Automatic loading.
Up to 50 wafers per batch. Up to 200mm wafer size.
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- Fast Heating and Cooling Capability,
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- Up to 200mm wafer size