Meyer Burger

IonSysModel 500 -Ion Beam Deposition System

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The affordable IonSys 500 system is used for ion beam etching in research and development as well as in low volume production. The machine can be loaded manually or via a single-substrate load-lock. The handling can be configured for standard wafers or for standardized carriers for processing different sample sizes.

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Key Benefits
  • Compact machine concept with small footprint
  • Easily adaptable process equipment to many different technologies
  • In-house developed key components like ion beam sources and substrate holders