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Model Ailesic-2000 -Activation Annealing System
FromULVAC GmbH
SiC power device recently became a key technology to realize a ‚low-carbon society‘. The Oxidation/Nitridization/Annealing system Ailesic 2000 from our partner Toyoko Kagaku is our solution to assure you improved performance of the SiC thermal processes and a stable mass production in the Activation Anneal Process.
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- automatic C2C high throughput vertical furnace for up to 150mm substrates
- operational temp. is 1200…1900°C (max. 2000°C)
- heating rate ≤100°C, cooling time is 115min from 1900°C to 300°C
- batch size is 25 wafers
- high purity carbon boat
- long life metal heater (>10 years)
- high temperature uniformity of ±5K
- footprint 1.25m x 4.35m
- Activation Anneal process ( Post Implantation Anneal )