Model DEPx - PECVD System for High Speed Coating Processes
Roth & Rau B.V. is offering thermal plasma-based PECVD equipment for the deposition of thin and thick films for various applications like photovoltaics, display and batteries. The DEPx is a further evolution of the DEPx 2000 series, which has a proven track record in high efficiency solar cell production. The DEPx provides fast and low cost deposition of various films dedicated for different markets.
- Lowest cost of ownership
- High uptime and easy to operate and maintain
- Highest deposition rate
- High process uniformity
- Easy configurability and multi-layer applications
- Modular design
- Small footprint
- Automation included
- Integrated electrical cabinet
- Integrated gas cabinet
- Inline metrology (optional)
The equipment has a modular design which allows for easy configurability. The DEPx combines an innovative linear motion system (LMS) and the proprietary Expanding Thermal Plasma (ETP) technologies to provide the highest process speed and superior reliability.
Expanding Thermal Plasma
The PECVD process is based on the proprietary ETP source technology, which is a dc Ar plasma discharge. The low voltage high pressure Ar plasma expands at supersonic speed through a narrow channel into the deposition chamber. At the exit nozzle a second gas is injected into the plasma stream. A third gas is injected just above the substrates. By choosing the right combination of precursor gasses the system can deposit various types of films.
The ETP source is a remote plasma, which means that plasma production, transport, and deposition are geometrically separated. The substrate does not play a role in plasma production and ion bombardment of highenergy particles on the substrate is virtually absent.
LMS Technology
The system works with a Linear Motor System (LMS), a patented technology. The carriers are transported on a rail system in vacuum without any feed-through to the outside. The motion of the carriers is achieved by a magnetic system placed outside the vacuum. Therefore the transport system is almost maintenance free and reduces the risk of a vacuum leak to a minimum.