Telindy Plus - Thermal Processing System
TELINDY PLUS™ represents the convergence of demonstrated experience and leading edge thermal processing technology. TELINDY PLUS™ incorporates specialized features originally developed for short TAT (Turn Around Time) on the TELFORMULA™ minibatch system as well as field proven, high productivity design elements from the previous generation TELINDY™ platform. Process performance and productivity have continued to improve and further expanded to ALD applications. New enhancements include improved maintenance access through architectural optimization to further reduce maintenance down time.
Dry gas chamber cleaning and low O2 environment loading area control have realized tangible gains in small particle management contributing to yield increases. The highest levels of productivity have been achieved by combining 125 wafer load size with TEL’s FTPS™ responsive heater capable of rapid heating and cooling coupled with a dual boat system option. TELINDY PLUS™ applications range from traditional silicon treatments such as diffused oxides and anneals to LPCVD Si (Poly Si, a-Si), SiO2, Si3N4 to leading edge ALD SiO2, Si3N4 and high-k dielectrics as well as radical (non-plasma) oxidation.