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Alfa Chemistry - Photolithography for SEMICONDUCTOR INDUSTRY

Photolithography is a photographic process by which a photosensitive polymer called a photoresist is exposed and developed to form a three-dimensional relief image on a substrate. The general processing steps of a typical photolithography process are as follows: substrate preparation, photoresist spin coating, pre-baking, exposure, post-exposure baking, development and post-baking. After the resist pattern is transferred to the underlying layer, the resist strip is the final operation in the photolithography process.