Advancing Precision in Plasma Enhanced ALD: The Role of the Hiden EQP Series

In materials science, precision in thin film deposition processes like Plasma Enhanced Atomic Layer Deposition (PEALD) is paramount. The ability to control film thickness and composition with high accuracy depends significantly on understanding and controlling the plasma used in the deposition process. Here, the Hiden EQP Series emerges as an essential tool for in-depth plasma analysis, offering unparalleled insights into the components critical to deposition outcomes.