Titanium Nitride Deposition using HiPIMS

Unleashing the Power of Hiden EQP Series for Titanium Nitride Deposition using HiPIMS

In today’s highly competitive market, industries are constantly seeking advanced coating techniques to enhance the performance of their products. One such technique is High Power Impulse Magnetron Sputtering (HiPIMS), a cutting-edge method used to deposit ultra-hard materials like titanium nitride (TiN). Hiden Analytical’s EQP Series offers an innovative solution for analyzing HiPIMS plasmas, providing insights into plasma species, mass, and energy to optimize the deposition process. In this blog, we’ll delve into the benefits of HiPIMS, the role of the Hiden EQP Series in analyzing HiPIMS plasmas, and its applications in Titanium Nitride coatings.