Why Gas-Phase Dynamics are Central to Low-Pressure Plasma Applications

Low-pressure plasma applications are pivotal in the advancement of materials science and surface engineering. They offer unparalleled precision and control in the modification and synthesis of surface coatings and films.

High Power Impulse Magnetron Sputtering (HiPIMS), Diamond-Like Carbon (DLC) coatings, plasma etching, Atomic Layer Deposition (ALD), and Pulsed Laser Deposition (PLD) coatings stand at the forefront of these technologies. The efficacy and efficiency of these processes are intrinsically linked to the underlying gas-phase dynamics. These govern interactions at molecular and atomic levels.