Tokyo Electron Limited (TEL) products

Tactras™ Vigus™ is a highly reliable 300mm plasma etch system that enhances etch process productivity. Scaling at advanced technology nodes makes the etch process more and more crucial. As the solution for etch process challenges, Tactras™ Vigus™ provides customized options for high aspect ratio holes, trench etch, mask and dielectric etch, and BEOL dielectric etch.

Certas LEAGA™ is an environment-friendly, high-throughput gas chemical etch system designed for 300mm wafers to provide surface etch and cleaning without the use of liquids. Its dry processing features watermark-free, unique selectivity performance over various SiO2 films and precise control of interface cleaning. It offers greater flexibility when combined with TEL’s cleaning system. Certas LEAGA™ supports a number of isotropic process requirements for 3D-structure devices with high utilization capability and low cost operation through its plasma-free solution.