Film Sense LLC
- Home
- Companies
- Film Sense LLC
- Products
- Film Sense - In Situ Ellipsometer
Film Sense - In Situ Ellipsometer
FromFilm Sense LLC
Film Sense Multi-Wavelength Ellipsometers are ideal for in situ realtime monitoring and control of thin film deposition and etching processes. The ability to watch and characterize a process in realtime by in situ ellipsometry measurements can be extremely beneficial for diagnosing problems in a process chamber and improving the efficiency of process development.
Most popular related searches
- Sub-monolayer thickness precision
- Determine film optical constants n&k and deposition rates, at multiple process conditions, without breaking vacuum
- Monitor and control the deposition of multilayer film structures
- FS-API interface for external software control (LabVIEW™ compatible)
- Applicable to most thin film deposition and etching techniques: Sputtering, ALD, ALE, MBE, CVD, PLD, etc.
- Completely self-contained system, with no external electronics box or fiber connections required
- LED light sources and no moving parts detector, for robust and reliable operation, and fast measurements
- Compact and light weight source and detector units (≈1 kg each)
- Optional adapters for mounting to standard 2.75” or 1.33” conflat flanges, with easy to adjust coarse and fine tilt stages
- Powerful software features for visualizing and analyzing dynamic ellipsometric data
- Adapters for mounting the FS-1 light source and detector units to standard 2.75” or 1.33″ conflat vacuum flanges (windows not included)
- Easy to adjust tilt stages for beam alignment
- In situ applications are varied and diverse. Contact Film Sense for more detailed mounting specifications and 3D CAD files to help integrate Film Sense Ellipsometers with your process chamber.