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Sentech Plasma System Equipment & Supplies
3 equipment items found
Manufactured by:SENTECH Instruments GmbH based inBerlin, GERMANY
Inductively coupled plasma (ICP) deposition system, the SENTECH SI 500 D for high density, low ion energy, and low-pressure plasma deposition of dielectric films and low-damage, low-temperature deposition for passivation layers. ...
Manufactured by:SENTECH Instruments GmbH based inBerlin, GERMANY
SENTECH Instruments GmbH offers advanced Cluster Configurations for Plasma Etching and Deposition, designed to enhance high yield and throughput for semiconductor processing. These systems combine plasma etch and deposition modules with up to two cassette stations, allowing for consistent, high-volume processing of wafers up to 200mm in diameter. ...
Manufactured by:SENTECH Instruments GmbH based inBerlin, GERMANY
The SENTECH SI 500 ICP-RIE System represents advanced inductively coupled plasma reactive ion etching technology, tailored for both research and industrial applications. Its core feature, the proprietary Planar Triple Spiral Antenna (PTSA) plasma source, offers uniform plasma generation with high ion density and low ion energy, ...