Tempress Systems
Tempress SPECTRUM - POCl3 Diffusion Process System
FromTempress Systems
The POCl3 diffusion process is the most suitable and versatile method for creating of an n-type dopant layer. Based on 40 years of experience, Tempress has established a POCl3 diffusion platform capable of delivering the most stable, reproducible and versatile process conditions at the lowest cost of ownership.
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- User friendly control software allows users to modify and monitor process recipes and develop their own production standards or record-cell recipes independently
- Access to the large in-house knowledge of Tempress concerning diffusion processes, ranging from stable emitter formation for the mass production of p-type solar cells to low doped emitters for advanced cell concepts and interaction with other cell processes
- Optimized uptimes and best cost-of-ownership together with excellent service and support ensures long term successful production capacity for our customers
- 4 independent tubes, 1600 wafers per hour
- Pre-installed process recipes for up to 140 Ω/sq sheet resistance with good within-wafer uniformity
- Integrated cassette to cassette full automation
- Only highest quality components are used to ensure system quality
- Automatic pressure control for stable and repeatable process
- >10 years equipment lifetime