Ascent - Model AP Series -Unprecedented Power Control System

• Advanced waveform control allows process fine-tuning
• Available for both dual-pulsed and single-pulsed magnetron sputtering applications
• Compact design incorporates DC and pulsing

Ascent^® AP power supplies deliver unprecedented plasma control in a compact solution for single-magnetron and dual-magnetron sputtering. Advanced Energy’s patented pulsing technology enables remarkable arc prevention, higher power levels, and increased throughput. Ascent AP’s comprehensive control parameters and wide operational range unlock material options to extend process flexibility and material innovation.

• Precise sputtering of dielectric and conductive films
• Extended process control and flexibility
• High film quality and throughput
• Repeatable, customizable films
• Higher power levels with reduced arc damage
• Easy integration and control

• Process customization with extensive power delivery parameters
• Advanced process management through a tiered approach to arc mitigation
• Compact, single-unit solution (up to 30 kW)
• Set Point Compensation™ technology for stable throughput
• Wide operational range to enable a variety of process materials