Plasma-Therm products

DEPOSITION

Plasma-Therm - PVD System for Semiconductor Processing

The Eclipse Mark IV PVD system, an enhancement over the Mark II, serves as a versatile solution for semiconductor processing. This physical vapor deposition (PVD) system is adept at depositing metals essential for interconnects, via fill, silicides, and other applications in semiconductor manufacturing. It features a compact design, addressing a wider spectrum of processes while maintaining effective utilization of space. The system accommodates gallium arsenide and other compound semiconductor wafers, as well as thinned silicon wafers, with its efficient wafer transport mechanism. The vacuum-isolated chambers minimize contamination risks, ensuring high-quality sputtering results. Integration with the upgraded Epoch controller enhances throughput and supports factory automation, making it a capable tool for manufacturing facilities seeking reliable and advanced PVD solutions.