Singulus Technologies AG products

The success of 3D in the cinemas is encouraging, the Hollywood Studios are increasing the production of 3D movies, broadcasters are launching 3D channels, the consumer electronics industry is readying a whole range of 3D TVs and Blu-ray players. SINGULUS is supporting all that with the right replication equipment for the 3D Blu-ray Discs!

Selenisation furnace for an optimized CIGS absorber formation.The CISARIS selenisation furnace is an inline rapid thermal processing equipment, designed for the CIGS absorber formation on large area glass substrates. CISARIS consists of a handling station, a vacuum tight process section, and a return conveyor and is optimized for the mass production of CIS solar modules.

Multi-Target-Module with 10 DC/RF CathodesMultiple film stack deposition, without the need to break ultra-high vacuum, is one of the key advantages of the MTM process module. Additional features such as wafer heating for hot substrate deposition (option) or a collinear Aligning Magnetic Field (AMF) are available. The AMF can be activated to align the magnetic easy axis during deposition of ferromagnetic films.The Linear Dynamic Deposition (LDD) technology enables the capability to deposit wedge films with a different film thickness across the wafer and to deposit alloy films with adjustable concentration gradients across one wafer. Both features allow a very cost effective development of film stacks and accelerate the devices development. The LDD technology is the key to delivering world class material uniformity across large wafers and exceptional precise control of ultrathin layer thickness down to 1 % of a nanometer.

The ROTARIS ultra-high vacuum system is a modular platform for fast, precise and fully automated thin-film sputter deposition. The ROTARIS is a bridge system for 200 mm and 300 mm wafer processing. Its main deposition chamber RSM (Rotating-Substrate-Module) can house up to 12 physical vapor deposition (PVD) cathodes with a target diameter of 100 mm.

SINGULAR ICP-PECVD is a fully automated innovative and modular PECVD coating tool for R&D and pilot production of crystalline silicon solar cells. The SINGULAR system is being applied for the development of passivation layers for high-ef ciency solar cells following conventional and new cell concepts, e.g. heterojunction solar cells. Thereby, the coating system meets the demands for both current and future PV cell development.