CISARIS - Selenisation Furnace
From Thermal Processing
Selenisation furnace for an optimized CIGS absorber formation.The CISARIS selenisation furnace is an inline rapid thermal processing equipment, designed for the CIGS absorber formation on large area glass substrates. CISARIS consists of a handling station, a vacuum tight process section, and a return conveyor and is optimized for the mass production of CIS solar modules.
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The main features of the CISARIS include a high up...
The main features of the CISARIS include a high uptime and mechanical yield as well as a fast cycle time which, in combination with the robust selenisation process, lead to a production capacity of over 25 MWp per year (depending on configuration, see page 7). CISARIS is a proven innovative and reliable equipment, which has been newly developed at SINGULUS based on the previous generation selenisation ovens. CISARIS can safely handle the thermal processing of large glass substrates of over 1 sqm at temperatures up to 550 °C and beyond under a toxic and corrosive gas atmosphere. High heating and cooling rates combined with an excellent temperature homogeneity during all process stages are the key factors, which allow the formation of an optimal CIGSSe absorber, required for the production of high efficiency solar modules.
Main Characteristics
- Second generation inline selenisation furnace with optimized cycle time
- Rapid heating (up to ∼ 4 °C/s) of large substrates with metal precursor coating (CIG)
- Homogeneous gas distribution and low gas consumption through optimized inlet system
- Introduction of H2S & H2Se gas at various stages of the process possible
- Uniform heating of large substrates up to 550 °C and beyond by using optimized IR radiators for achieving the required crystal quality
- Uniform cooling of the substrate to avoid glass warpage
- Excellent temperature control (mean variation < 5 °C) at all process stages
- Process under vacuum and at atmospheric pressure
- Oxygen and water vapor free process atmosphere guaranteed through pump/purge cycles
- Excellent maintenance concept with maximum accessibility of all machine components
- Proven safety system based on a solid risk management and safety engineering
Key Components:
- The CISARIS machine consists of the following key components (example):
- Handling section: Transport of the substrates between the FAB automation and the CISARIS
- Process section:
- Load chamber #1 (LC1): Pump- and purge cycles to remove atmospheric residuals
- Load chamber #2 (LC2): Process gas inlet Pump- and purge cycles to remove toxic gases from the process chamber
- Heating section: (HC1/HC2/HC3/HC4/HC5) Five successive heating chambers for the formation of the CIGSSe absorber material
- Cooling section: CC1/CC2 Two successive cooling chambers for the cooling of the substrate down to the specified temperature
- Exit chamber (EC): Pump and purge cycles to remove toxic gases from the process chamber
- Return conveyor section: Returning the substrate to the handling system and additional cooling process in a N2 atmosphere via forced N2 cooling stations
- Periphery:
- Housing
- Cold traps (selenium absorber)
- Oil heating system
- Pumping system
- Gas detection system
- Metrology
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