Advanced Energy Industries, Inc.
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Xstream - High-Quality, Chamber-Clean Remote Plasma Source
Built to outlast and outperform the competition, the Xstream remote plasma source (RPS) is ideal for chamber cleaning purposes. It features a patented ignition method and algorithm as well as a proprietary aluminum-alloy, hard-anodized chamber.
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- Proven Performance: Unmatched reliability with proven field performance
- Unique Ignition Method: Reduce tool downtime with dependable plasma ignition
- No Expensive Coatings Needed: Custom alloy and advanced anodization ensure longer chamber life
- Rapid Chamber Cleaning: High feed-gas dissociation rate for efficient operation
The highly efficient Xstream RPS dissociates large volumes of NF3 and quickly cleans chambers, improving your overall tool performance. Its plasma chamber showcases high-purity aluminum alloy and patented cooling capabilities. Built to last for years without repair or expensive chamber coatings, the Xstream RPS is the smart choice for dependability and efficient performance.
- Eliminate expensive chamber coatings with custom aluminum alloy and Type III hard anodization
- Improve chamber performance and durability via a cooling system that minimizes thermal stress
- Increase efficiency and improve power delivery to the plasma with an Active Match Network
- Precisely control power and processes thanks to real-time plasma measurements
- Achieve reliable and reproducible plasma ignition via a patented ignition system
- Highly reliable RPS maximizes tool uptime
- Effective reactive species transportation to process chamber for improved performance
- Transformer coupled plasma (TCP) source with integrated Active Match Network (AMN)
- 225 kHz to 660 kHz operating frequency
- 8 kW/10 kW power models