Xstream - High-Quality, Chamber-Clean Remote Plasma Source
From Remote Plasma Source
Built to outlast and outperform the competition, the Xstream remote plasma source (RPS) is ideal for chamber cleaning purposes. It features a patented ignition method and algorithm as well as a proprietary aluminum-alloy, hard-anodized chamber.
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Proven Performance: Unmatched reliability with pro...
- Proven Performance: Unmatched reliability with proven field performance
- Unique Ignition Method: Reduce tool downtime with dependable plasma ignition
- No Expensive Coatings Needed: Custom alloy and advanced anodization ensure longer chamber life
- Rapid Chamber Cleaning: High feed-gas dissociation rate for efficient operation
The highly efficient Xstream RPS dissociates large volumes of NF3 and quickly cleans chambers, improving your overall tool performance. Its plasma chamber showcases high-purity aluminum alloy and patented cooling capabilities. Built to last for years without repair or expensive chamber coatings, the Xstream RPS is the smart choice for dependability and efficient performance.
Benefits
- Eliminate expensive chamber coatings with custom aluminum alloy and Type III hard anodization
- Improve chamber performance and durability via a cooling system that minimizes thermal stress
- Increase efficiency and improve power delivery to the plasma with an Active Match Network
- Precisely control power and processes thanks to real-time plasma measurements
- Achieve reliable and reproducible plasma ignition via a patented ignition system
Features
- Highly reliable RPS maximizes tool uptime
- Effective reactive species transportation to process chamber for improved performance
- Transformer coupled plasma (TCP) source with integrated Active Match Network (AMN)
- 225 kHz to 660 kHz operating frequency
- 8 kW/10 kW power models
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