Ion Source Plasma Articles & Analysis
4 articles found
Pulsed laser deposition (PLD) has proved to be an outstanding technique for the deposition of complex oxide thin films due to its ability to congruently transfer the target composition to the deposited film. The deposition of many oxides is usually conducted using a pulsed KrF laser (λ= 248 nm corresponding to 4.99 eV/photon) with a pulse length of a few 10 ns in an O2 background gas. The ...
A review of the last ten years of advances in temporal resolved plasma diagnostics for pulsed operated 2.45 GHz microwave-driven hydrogen discharges is presented. Special attention has been paid to the study of breakdown and decay processes where Hiden systems have been used showing relevant results. Density and temperature measurements: Langmuir probe made of tungsten wire 6mmlong and 0.5 mm ...
TIPS (Test-bench for Ion Source Plasma Studies) is a 2.45 GHz Hydrogen Electron Cyclotron Resonance (ECR) plasma generator designed to be used as a flexible device to study the relationship between the engineering design of the source and the physical parameters of the generated plasma [1-5]. In ...
The effect of nitrogen plasma immersion ion implantation (PIII) treatment on the thin films of gadolinium oxide (GdxOy) for use in resistive random access memory (RRAM) applications is reported. From the X–ray photoelectron spectroscopic analysis, the formation of Gd–N bond was evidenced by a shift in the peak Gd 4d peaks towards lower binding energy. It was observed that the nitrogen PIII ...