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Tempress SPECTRUM - Model PECVD - Batch-type PECVD System for SiOx and SiNx
FromTempress Systems
Tempress SPECTRUM is a batch-type PECVD system for SiOx and SiNx deposition on silicon solar cells. It uses the benefits of a direct plasma system (i.e. excellent emitter passivation, dense and closed layer deposition, low tool maintenance) while maintaining good color uniformities.
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Key system features
- High throughput >200 MW / system
- The system allows for better color uniformity than achieved on conventional direct plasma PECVD systems. This is achieved by using our uniquely designed boat
- Tempress’ PID solution has proven to pass even the most stringent PID tests without any cell efficiency penalty
- Graded layers for efficiency enhancement
Customer benefits
- Superior passivation at the surface and in the bulk of the cell, due to the exposure to the direct plasma
- Our PID-free solution enables production of high efficiency cells that are proven to be resistant to PID
- The large batch size allows for >10% CoO reduction in SiNx deposition compared to competitor systems and releases the bottleneck in conventional PV cell manufacturing lines
- The confinement of the plasma to the substrates and boat ensures only negligible chamber cleaning and maximum productivity of the equipment