Advanced Energy Industries, Inc.
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Advanced Energy Industries, Inc. products

Plasma Power Generators - RF Plasma Generators

Apex - RF Power-Delivery Systems

High-Power Density for Compact Installation. When space is limited, but performance is critical, streamlined APEX RF generators offer various mounting options and power you can rely on.

Cesar - Plasma Power Generator

Unparalleled Breadth of RF-Application Delivery without Custom Lead Times. Robust and versatile, the Cesar platform provides excellent RF power delivery across a wide range of frequencies and power outputs.

Advanced Energy - Model eVoS LE - Asymmetric Bias Waveform Generator

Asymmetric Bias Waveform Generator for Direct Control of Substrate Voltage and Ion Energy. Advanced Energy’s eVoS platform is a revolutionary power technology for the direct control of ion energy distribution in plasma processing. The integrated, single-enclosure system delivers a customized width and precise control of ion energy for node etch and deposition applications. With a 1.2 kV asymmetric waveform, the eVoS LE applies metrology and proprietary control to deliver bias plasma performance for sensitive feature formation and efficiency unachievable by conventional RF methods.

HiLight - RF Power-Delivery Systems

A Compact, Economical, Easy to Install, Low Power RF Platform. Compact, lightweight, and air-cooled, HiLight™ RF generators are ideal for low-power, on-board applications, suiting 13.56 MHz plasma and 1 or 2 MHz processes.

Model LFGS - Mid-Frequency Generator Tailored for Plasma Processing

The versatile, variable-frequency LFGS generator (1250 W, 40 to 500 kHz) suits a wide variety of semiconductor and general plasma-processing applications, including sputtering, reactive ion etching, plasma deposition, polymerization, and surface treatment. Its compact 19", rack-mountable, air-cooled package eases installation and saves valuable space. With a half-bridge, class-D amplifier design, the LFGS power supply enables the lowest reflected power commercially available.

Paramount - Repeatable Power Delivery for Core Plasma Applications

Advance your process development with a new focus on operating flexibility. Paramount® RF generators offer wide frequency and power ranges, support multiple integration scenarios, and are equipped with standard serial or analog interfaces. The Paramount platform’s digital architecture provides precise power management and streamlines new function integration — no lead times or hardware changes needed. High-power output and repeatable performance is achieved by real-time detection of plasma changes. And internal-protection limits facilitate reliable operation.

Paramount - Model HFi - Integrated Generator and Solid-State Matching RF Power Delivery System

Advanced Energy`s Paramount HFi is a 13.56 MHz RF power delivery system with an integrated solid-state matching network capable of operating across a wide variety of impedance zones. The solution offers consistent power delivery, high power density, and exceptional reliability.

Paramount Plus - Multi-Level Pulsing and Pulse Waveform Control for Emerging Plasma Applications

Get the broadest feature set available in a pulsed-RF product. The Paramount Plus offers precise RF regulation, sophisticated pulse manipulation, and advanced data acquisition. Designed to cover an extensive range of RF energy — frequencies of 400 kHz to 60 MHz and power levels of 1.5 to 15 kW — the Paramount Plus delivers the repeatability and reliability you require.

Model PDX - RF Plasma Generators

Need a highly efficient, compact, easy-to-integrate power source? The PDX® series provides extremely accurate, highly repeatable process control, helping to ensure process uniformity and high throughput. It’s wide frequency range of operation delivers optimal control across numerous applications. The PDX low-power (LP) series is available in 1250 W and 1400 W versions and the PDX high-power (HP) series is available in 5000 W and 8000 W versions.