Refine by
Matching Networks Equipment Supplied In Denmark
8 equipment items found
Manufactured by:Advanced Energy Industries, Inc. based inDenver, COLORADO (USA)
Agile, Precise Power Delivery for Demanding High-Speed Matching Applications. Advanced Energy's Navigator II FCi enables improved process control with precise power delivery and tuning. The high-speed matching network is optimized for critical, power sensitive, short duration plasma process steps. Conventional longer steps and wide tuning range, ...
Manufactured by:Advanced Energy Industries, Inc. based inDenver, COLORADO (USA)
The Navigator ll matching network’s advanced digital technology speeds tuning and match response ...
Manufactured by:Advanced Energy Industries, Inc. based inDenver, COLORADO (USA)
Economical, Digital, Configurable Matching Network Solution. The Navio matching network delivers quick, accurate, and repeatable impedance across many ...
Manufactured by:Advanced Energy Industries, Inc. based inDenver, COLORADO (USA)
Remote Plasma Source and Power Delivery System that Enables Abatement of Exhaust Gasses. Litmas is an all-in-one remote plasma source combining the power supply, LitmasMatch™ matching network, and plasma chamber into one compact ...
Manufactured by:Advanced Energy Industries, Inc. based inDenver, COLORADO (USA)
Advanced Energy's Paramount HFi is a 13.56 MHz RF power delivery system with an integrated solid-state matching network capable of operating across a wide variety of impedance zones. The solution offers consistent power delivery, high power density, and exceptional ...
Manufactured by:Advanced Energy Industries, Inc. based inDenver, COLORADO (USA)
Built to outlast and outperform the competition, the Xstream remote plasma source (RPS) is ideal for chamber cleaning purposes. It features a patented ignition method and algorithm as well as a proprietary aluminum-alloy, hard-anodized ...
Manufactured by:Advanced Energy Industries, Inc. based inDenver, COLORADO (USA)
Low-Frequency Series with Enhanced Arc Control and Internal Load Matching for 40 kHz Reactive Sputtering Applications. The PEII series of power supplies are the trusted standard for dual-magnetron sputtering, as an effective vacuum cleaning tool, and in multiple PECVD ...
Manufactured by:Advanced Energy Industries, Inc. based inDenver, COLORADO (USA)
Asymmetric Bias Waveform Generator for Direct Control of Substrate Voltage and Ion Energy. Advanced Energy’s eVoS platform is a revolutionary power technology for the direct control of ion energy distribution in plasma processing. The integrated, single-enclosure system delivers a customized width and precise control of ion energy for node etch and deposition applications. With a 1.2 kV ...