Model WHP - Wafer Handling Plasma System
From Photovoltaics
The highly sophisticated machine platform WHP meets the various requirements of solar cell mass production. The WHP ensures the efficient, fully automated loading and unloading of process boats in PECVD and multi-layer coating processes.
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WHP Configuration
The WHP system was specially developed for the automated loading and unloading of batch-type systems for the passivation and nitride coating in c-Si solar cell processing. WHP is available in a variety of versions to ensure compatibility with the specific process requirements, capacities and degrees of automation.
Thanks to sophisticated gripping technologies and the precise positioning of the wafers in the process boat, it can be used equally well in the production of standard cell concepts and in the production of highly efficient solar cells – such as PERC or PID-free solar cells.
Through patented technologies to prevent damage to very delicate wafer surfaces, the machine is ideal for loading and unloading of Aluminium Oxide (AlOx) PECVD process systems.
In the configuration WHP HTP, the system achieves a throughput of 8,000 wafer/h, making it the most powerful system available on the market.
Technical Data and Features
- configurable for various batch-type PECVD systems for passivation and nitride coating (SiNx, SiOx, AlOx)
- precise wafer alignment
- multiple vacuum gripper with single wafer detection
- high process quality due to damage-free positioning and alignment of the wafers in the process boat
- automation of up to two process ovens with one WHP HTP
- virtual material tracking
Options
- MES SECS / GEM PV2
- color inspection system with reject bins
- breakage detection for unprocessed wafers
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